A new technical paper titled “Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology” was published by researchers at Samsung. “We propose an ultra-wide-field ...

Artificial intelligence is one of the driving forces in today’s semiconductor industry, with more traditional market drivers like high performance compute and smart phones continuing to play important ...

Ellipsometry and reflectometry are optical measurement techniques used for surface analysis and thin-film characterization. 1 Both methods rely on light reflection but differ in their approach.

This free of charge workshop is aimed at both experienced ellipsometry users as well as people new to ellipsometry. The format of the workshop includes an introduction, fundamentals of ellipsometric ...

Alfred University is recipient of a National Science Foundation (NSF) grant of nearly $350,000, which will be used to acquire equipment that will enhance multi-disciplinary research and education ...

Polarization is a fundamental property of light waves. Polarization information of the light interacted with an object can be used to reveal its physical properties of interest, such as material, ...

Abstract: Spectroscopic ellipsometry is a very sensitive optical metrology technique commonly used in semiconductor manufacturing lines to accurately measure the thickness and refractive index of ...

Departamento de Física de la Materia Condensada, Universidad de Cádiz, Campus de Puerto Real, E11519 Puerto Real, Spain Institute of Research on Electron Microscopy and Materials (IMEYMAT), ...

Conventional spectroscopic ellipsometry is a powerful tool in optical metrology. However, when it comes to the characterization of non-periodic nanostructures or structured fields that are much ...