Abstract: Resist line edge roughness (LER) is generally regarded as noise residues accumulated in every lithography processing step. Current state of art LER simulators model the physical causes of ...
Department of Physical Chemistry, Faculty of Chemistry, Rzeszow University of Technology, Al. Powstańców Warszawy 6, Rzeszów 35-959, Poland ...
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I drew for 1 hour using only one continuous line
One pen. One line. No breaks. In this wild drawing challenge, I attempt the impossible: creating an entire piece of art using only ONE continuous line… for a full hour. No lifting the pen, no undo ...
Julia is the associate news editor for Health, where she edits and publishes news articles on trending health and wellness topics. Her work has been featured in The Heights, an independent student ...
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