Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.
Researchers from the Department of Energy's SLAC National Accelerator Laboratory and the University of California, Los ...
A joint research team from the Institute of Metal Research (IMR) of the Chinese Academy of Sciences and the Songshan Lake Materials Laboratory has achieved precise control and real-time observation of ...
A new kind of plasma accelerator has cleared a hurdle that has dogged the field for decades, lifting electron energy and beam ...
Most of today's quantum computers rely on qubits with Josephson junctions that work for now but likely won't scale as needed ...